To provide a positioning device of a mask which can determine the coordinates of the center of rotation of a mask stage with high precision and can position a mask and a substrate with high precision, and to provide a method of calculating the center of rotation of a mask.
The positioning device 70 comprises a mask stage 10 with a rotation mechanism 16x, a plurality of alignment cameras 18 which detect a plurality of alignment marks Mm, Wm provided on a mask M and a substrate W, and a controller 71 which controls operation of the mask stage 10 so that the position of each alignment mark Mm, Wm is aligned using images obtained by the alignment cameras 18. The alignment cameras 18 capture the images of alignment marks Mm, Wm corresponding to respective alignment cameras 18. The image of each alignment mark Mm, Wm is captured again after rotating the mask stage 10, and then the coordinates of the rotation center E of the mask stage 10 is calculated.
HASHIMOTO HIROMITSU
Hironori Honda
Toshimitsu Ichikawa