Title:
POSITIVE PHOTOSENSITIVE PASTE
Document Type and Number:
Japanese Patent JP2010134003
Kind Code:
A
Abstract:
To provide a positive photosensitive paste from which a fine pattern of an inorganic material can be formed even in a thick film.
The positive photosensitive paste contains an alkali-soluble resin, a photoacid generator and an inorganic powder, wherein the alkali-soluble resin contains an acrylic resin in a range from 5 to 40 mass% and a novolac resin in a range from 60 to 95 mass%.
COPYRIGHT: (C)2010,JPO&INPIT
Inventors:
KUSANO KAZUTAKA
IWATA YUUKO
MITSUI HIROKO
IWATA YUUKO
MITSUI HIROKO
Application Number:
JP2008307124A
Publication Date:
June 17, 2010
Filing Date:
December 02, 2008
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
G03F7/023; G03F7/004; G03F7/039