Title:
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
Document Type and Number:
Japanese Patent JP2009222937
Kind Code:
A
Abstract:
To provide a resist composition excellent in sensitivity, resolution, LER (line edge roughness), pattern features and outgas properties.
The resist composition contains (A) a resin containing a repeating unit expressed by general formula (I) and (B) a compound expressed by general formula (II). In formulae, each note represents a predetermined element or group.
Inventors:
KAMIMURA SATOSHI
Application Number:
JP2008066743A
Publication Date:
October 01, 2009
Filing Date:
March 14, 2008
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/039; C08F20/18; C08F212/14; H01L21/027
Attorney, Agent or Firm:
Takeshi Takamatsu
Kiyozumi Yazawa
Kiyozumi Yazawa
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