Title:
ポジ型レジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP7468295
Kind Code:
B2
Abstract:
A positive resist composition is provided comprising a base polymer having a pendant in the form of a fluorinated phenol group whose hydroxy group is substituted with an acid labile group. The composition offers a high sensitivity and resolution as well as reduced edge roughness and size variation.
Inventors:
Jun Hatakeyama
Koji Hasegawa
Koji Hasegawa
Application Number:
JP2020179277A
Publication Date:
April 16, 2024
Filing Date:
October 27, 2020
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/039; C08F220/30; G03F7/004; G03F7/20
Domestic Patent References:
| JP2019101417A | ||||
| JP2016040598A |
Attorney, Agent or Firm:
Patent Attorney Corporation Eimei International Patent Office