PURPOSE: To provide the positive type photosensitive composition, which can prevent the generation of halation without hindering sensitivity, resolution and residual film ratio.
CONSTITUTION: This positive type resist composition contains alkali soluble phenol resin (a), 1,2-naphthoquinonediazide sulfonic acid ester (b) of the compound having dibendzylideneaceton framework. In the formula, R1-R10 mean hydrogen atom, halogen atom, hydroxyl group, alkyl group, aryl group, alkenyl group, alkinyl group, amino group, nitro group, cyano group, alkoxy group, acetyl group, 1, 2-naphthoquinonediazide-5-sulfonyl group, and they can be the same one or they can be different from each other, and at least of them means hydroxyl group. R11-R12 mean hydrogen atom, alkyl group and aryl group, and they can be the same one or they can be different from each other.
HAYASHI ATSUSHI
KAWADA MASAJI
