Title:
PROCESS CONTROL SYSTEM, AND PROCESS CONTROL METHOD
Document Type and Number:
Japanese Patent JP2008147443
Kind Code:
A
Abstract:
To provide a process control system and a process control method that improve throughput of the whole manufacturing process while eliminating work executed by manpower.
A server 3 monitors each state of inspection devices 1 so as to specify the inspection device 1 in an idle state. Subsequently, the server 3 outputs a control command, which instructs carrying-in of a wafer 6 into the inspection device 1 detected being in an idle state, to a substrate carrying-in control part 5. The substrate carrying-in control part 5 receiving the control command allows the wafer 6 to be carried-in into the inspection device 1 indicated by the control command.
Inventors:
FUKUSHIMA TETSUYA
Application Number:
JP2006333350A
Publication Date:
June 26, 2008
Filing Date:
December 11, 2006
Export Citation:
Assignee:
OLYMPUS CORP
International Classes:
H01L21/02; G05B19/418
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Tadao Takashiba
Hiroshi Masui
Masatake Shiga
Masakazu Aoyama
Suzuki Mitsuyoshi
Tadao Takashiba
Hiroshi Masui
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