To provide a process for producing a polymer which has a small variation of the compositional ratio of constituting units in a copolymer and good solubility in a solvent, and can obtain high sensitivity when used in a resist composition.
The process for producing a polymer (P) composed of constituting units α'1 to α'n by polymerizing two or more monomers α1 to αn includes a step of previously charging a first solution containing monomers α1 to αn at a first composition in a reaction vessel and a step of dropping a second solution containing monomers α1 to αn at a second composition into the reaction vessel. The second composition is the same as the design composition showing a target value of the constituting units α'1 to α'n-containing ratio in the polymer (P) and the first composition is a previously found composition taking the design composition and the reactivity of each monomer used in polymerization into consideration.
OSHIKIRI TOMOYA
JP2001201856A | 2001-07-27 | |||
JPH1053620A | 1998-02-24 | |||
JP2006036914A | 2006-02-09 | |||
JP2003246825A | 2003-09-05 | |||
JP2010532807A | 2010-10-14 | |||
JP2010513669A | 2010-04-30 | |||
JP2001201856A | 2001-07-27 | |||
JPH1053620A | 1998-02-24 | |||
JP2006036914A | 2006-02-09 | |||
JP2003246825A | 2003-09-05 | |||
JP2010532807A | 2010-10-14 | |||
JP2010513669A | 2010-04-30 |
WO2009007155A1 | 2009-01-15 | |||
WO2008082503A2 | 2008-07-10 | |||
WO2009007155A1 | 2009-01-15 | |||
WO2008082503A2 | 2008-07-10 |
Tadashi Takahashi
Takashi Watanabe
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
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