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Title:
PROCESS FOR PRODUCING POLYMER, POLYMER FOR RESIST, RESIST COMPOSITION AND METHOD FOR MANUFACTURING SUBSTRATE
Document Type and Number:
Japanese Patent JP2010254810
Kind Code:
A
Abstract:

To provide a process for producing a polymer which has a small variation of the compositional ratio of constituting units in a copolymer and good solubility in a solvent, and can obtain high sensitivity when used in a resist composition.

The process for producing a polymer (P) composed of constituting units α'1 to α'n by polymerizing two or more monomers α1 to αn includes a step of previously charging a first solution containing monomers α1 to αn at a first composition in a reaction vessel and a step of dropping a second solution containing monomers α1 to αn at a second composition into the reaction vessel. The second composition is the same as the design composition showing a target value of the constituting units α'1 to α'n-containing ratio in the polymer (P) and the first composition is a previously found composition taking the design composition and the reactivity of each monomer used in polymerization into consideration.


Inventors:
YASUDA ATSUSHI
OSHIKIRI TOMOYA
Application Number:
JP2009106618A
Publication Date:
November 11, 2010
Filing Date:
April 24, 2009
Export Citation:
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Assignee:
MITSUBISHI RAYON CO
International Classes:
C08F2/04; C08F218/00; G03F7/039
Domestic Patent References:
JP2001201856A2001-07-27
JPH1053620A1998-02-24
JP2006036914A2006-02-09
JP2003246825A2003-09-05
JP2010532807A2010-10-14
JP2010513669A2010-04-30
JP2001201856A2001-07-27
JPH1053620A1998-02-24
JP2006036914A2006-02-09
JP2003246825A2003-09-05
JP2010532807A2010-10-14
JP2010513669A2010-04-30
Foreign References:
WO2009007155A12009-01-15
WO2008082503A22008-07-10
WO2009007155A12009-01-15
WO2008082503A22008-07-10
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama