Title:
PROCESSING DEVICE USING MICROWAVE PLASMA
Document Type and Number:
Japanese Patent JPH09102400
Kind Code:
A
Abstract:
To provide a processing device for generating highly uniform microwave plasma having magnetic field wherein consumed electric power is small and high speed processing is possible.
A main magnetic field is formed by a large-bore permanent magnet 102 provided outside of a vacuum case 101 and a microwave is supplied into a gas phase by radial strip lines 106 arranged in the proximity of and parallel to a flat plate 105 of earth potential. Plasma of high ion density and radical density can be thereby formed with electric power consumption lowered. Moreover electromagnetic waves can be radiated uniformly over a wide area and large-bore, highly uniform plasma is acquired.
More Like This:
| JP2009295573 | IMPEDANCE MEASURING DEVICE |
| JP3124960 | PLAZMA SEALING STRUCTURE OF HIGH CONDUCTANCE |
| JPH02280091 | PLASMA NUCLEAR FUSION APPARATUS |
Inventors:
YOKOGAWA KATANOBU
ONO TETSUO
TSUJIMOTO KAZUNORI
ITABASHI NAOSHI
MORI MASASHI
ONO TETSUO
TSUJIMOTO KAZUNORI
ITABASHI NAOSHI
MORI MASASHI
Application Number:
JP32682495A
Publication Date:
April 15, 1997
Filing Date:
December 15, 1995
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H05H1/46; C23C16/50; C23C16/511; C23F4/00; H01L21/203; H01L21/205; H01L21/302; H01L21/3065; (IPC1-7): H05H1/46; C23C16/50; C23F4/00; H01L21/203; H01L21/205; H01L21/3065
Attorney, Agent or Firm:
Ogawa Katsuo