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Patent Searching and Data


Title:
PROCESSING METHOD AND DEVICE FOR FINE PARTICLE INJECTION
Document Type and Number:
Japanese Patent JPH07205028
Kind Code:
A
Abstract:

PURPOSE: To prevent th side etching of a resist mask and to transfer this form to surface to be processed as it is by arranging the long side of the surface to be processed and the long side of a nozzle port in a rectangular nozzle in parallel and scanning the nozzle port in parallel to the long side of the processed surface.

CONSTITUTION: The surface 10 to be processed of a processed surface 2 is formed in a shape similar to a rectangle or the like and a ratio between a ling side and a short side is set at 2 or higher. A resist mask 1 having an opening 3 formed in a specified pattern is covered on the surface 10 to be processed. Fine particles 4 are injected from a rectangular nozzle 6 to the surface of the resist mask 1 and a recessed part is formed thereon. In this case, the long side of the surface 10 to be processed and that of a nozzle port 6A in the rectangular nozzle 6 are arranged in parallel to each other. The nozzle 6A is scanned in parallel to the long side of the surface 10 to be processed. That is, by providing an angle between the flowing direction of fine particles 4 and the moving direction of the rectangular nozzle 6, the side etching of the resist mask 1 is prevented.


Inventors:
FUKUTANI AKIHITO
Application Number:
JP35331093A
Publication Date:
August 08, 1995
Filing Date:
December 30, 1993
Export Citation:
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Assignee:
SONY CORP
International Classes:
B24C5/02; B24C1/04; (IPC1-7): B24C1/04; B24C5/02
Attorney, Agent or Firm:
Kei Tanabe