Title:
加工廃液処理方法
Document Type and Number:
Japanese Patent JP7280790
Kind Code:
B2
Abstract:
To efficiently irradiate organic substances contained in waste liquid with ultraviolet rays to ionize the organic substances and cause the ionized organic substances to be adsorbed on ion-exchange resin in a waste liquid treatment method for regenerating processing liquid from processing waste liquid.SOLUTION: A processing waste liquid treatment method includes a step of sending a processing waste liquid stored in a waste liquid tank 20 to a filter 31 of a waste removing filter unit 3 to remove processing waste, a step of passing processing-waste-removed fresh water through an ion exchange resin of an ion exchange resin unit 6 so that contained ions are adsorbed and removed by the ion exchange resin, a step of sending the water which has been subjected to the ion removing step, to a reverse osmosis membrane of a reverse osmosis membrane unit 7, and separating the water into permeated water that has permeated the reverse osmosis membrane and does not contain organic substances and concentrated water which has not permeated the reverse osmosis membrane and contains the organic substances, a step of irradiating the separated concentrated water with ultraviolet rays to ionize organic substances, a second ion removing step of passing the concentrated water after the ultraviolet irradiation step through the ion exchange resin to cause organic ions of the concentrated water to be adsorbed by the ion exchange resin, thereby making pure water. The permeated water that has permeated the reverse osmosis membrane and does not contain the organic substances is used as processing liquid.SELECTED DRAWING: Figure 1
More Like This:
Inventors:
Atsushi Saito
Miki Yoshida
Miki Yoshida
Application Number:
JP2019173957A
Publication Date:
May 24, 2023
Filing Date:
September 25, 2019
Export Citation:
Assignee:
Disco Co., Ltd.
International Classes:
H01L21/304; B01D61/02; B01D61/04; B01D61/44; B01D61/58; B24B55/12; C02F1/32; C02F1/42; C02F1/44; C02F1/469; H01L21/301
Domestic Patent References:
| JP2016215124A | ||||
| JP2016131954A | ||||
| JP2012218095A | ||||
| JP2012218134A | ||||
| JP2015108526A | ||||
| JP2008260017A | ||||
| JP2006192378A | ||||
| JP2009112945A |
Foreign References:
| US20050247631 | ||||
| US6001244 |
Attorney, Agent or Firm:
Patent Attorney Corporation Tokyo Alpa Patent Office