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Title:
PRODUCTION OF COMPOUND SEMICONDUCTOR EPITAXIAL WAFER
Document Type and Number:
Japanese Patent JP2000315713
Kind Code:
A
Abstract:

To realize a highly accurate noncontact measurement of a specified semiconductor composition in a short time by estimating the composition of a specified semiconductor layer based on the peak wavelength of photoluminescence measurement of a compound semiconductor epitaxial wafer and then selecting only the compositions falling within a specified range.

An InGaAs layer has an energy gap dependent on the composition ratio of In (or Ga). More specifically, the energy gap decreases as the composition ratio of In increases and the peak wavelength of luminescence is varied as the composition ratio of In is varied. Photoluminescence is then measured for a compound semiconductor epitaxial wafer and the peak wavelength thereof is detected. Subsequently, the composition of In in the InGaAs layer is estimated and only such compositions as falling within a specified range are selected thus realizing a highly accurate noncontact measurement of the composition of In in the InGaAs layer of a semiconductor epitaxial wafer in a short time.


Inventors:
SASAKI YUKIO
OTOGI YOHEI
Application Number:
JP12477499A
Publication Date:
November 14, 2000
Filing Date:
April 30, 1999
Export Citation:
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Assignee:
HITACHI CABLE
International Classes:
H01L29/812; G01N21/64; H01L21/338; H01L21/66; H01L29/778; (IPC1-7): H01L21/66; G01N21/64; H01L21/338; H01L29/778; H01L29/812
Domestic Patent References:
JPH09167789A1997-06-24
JPH0818035A1996-01-19
Attorney, Agent or Firm:
Nobuo Kinutani