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Title:
PRODUCTION OF HEXAMETHYLDISILOXANE
Document Type and Number:
Japanese Patent JPH0848690
Kind Code:
A
Abstract:

PURPOSE: To safely, inexpensively and simply obtain a compound useful as a cleaning agent substituting fluorocarbon by reacting hexamethyldisilane with an oxidizing agent aqueous solution in the presence of an iodine compound.

CONSTITUTION: This method for producing hexamethyldisiloxane is to drop (C) preferably 0.5-2.0mol (especially 1.0-1.2mol) of an aqueous solution of an oxidizing agent such as an aqueous solution of sodium hypochlorite or an aqueous solution of hydrogen peroxide to (A) 1mol of hexamethyldisilane while stirring an aqueous solution blending (B) preferably 0.01-0.5mol (especially 0.03-0.1mol) of iodine compound, preferably comprising iodine or hydrogen iodide and react the component A with the component C, preferably at 20-90°C (especially at 60-80°C) for about 5-20hr. Furthermore, it is preferable that the iodine compound always exists in the system during progress of the reaction and dropping rate of the component C is controlled without depositing iodine and loosing purple of the aqueous solution of iodine. After the reaction is finished, the aqueous solution of sodium hydrogensulfite is added thereto to reduce the residual iodine and excess oxidizing agent.


Inventors:
KUBOTA YASUBUMI
KUBOTA TORU
YAMAMOTO AKIRA
ENDO MIKIO
Application Number:
JP21416294A
Publication Date:
February 20, 1996
Filing Date:
August 05, 1994
Export Citation:
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Assignee:
SHINETSU CHEMICAL CO
International Classes:
B01J27/06; C07B61/00; C07F7/08; (IPC1-7): C07F7/08; B01J27/06