Title:
PRODUCTION OF HIGH PURITY SOLUTION FORMING POSITIVE TYPE PHOTOSENSITIVE FILM
Document Type and Number:
Japanese Patent JPH05313366
Kind Code:
A
Abstract:
PURPOSE: To provide a soln. hardly contg. a metal, suppressing the residue of the metal on a substrate, inhibiting the shortening of life time and the degradation of electrical characteristics and capable of forming a resist pattern in a high yield.
CONSTITUTION: An alkali-soluble resin and a compd. having a quinonediazido group are dissolved in a solvent based on a water-insoluble ketone type solvent and the resulting soln. is mixed with an aq. acid soln. and allowed to stand to form two layers. A nonaq. layer is then separated from the two layers and the objective high purity soln. forming a positive type photosensitive film is obtd.
Inventors:
ONO ISATO
OBARA HIDEKATSU
NAKAYAMA TOSHIMASA
OBARA HIDEKATSU
NAKAYAMA TOSHIMASA
Application Number:
JP13754592A
Publication Date:
November 26, 1993
Filing Date:
May 01, 1992
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
G03F7/022; H01L21/027; (IPC1-7): G03F7/022; H01L21/027
Domestic Patent References:
| JPS63126502A | 1988-05-30 | |||
| JPH05204148A | 1993-08-13 |
Attorney, Agent or Firm:
Agata Akira (1 person outside)