PURPOSE: To obtain high-accuracy pattern shapes with good productivity by sticking a negative type photoresist material onto the magnetic medium-facing surface of the magnetic head slider and dry etching this resist material at a large incident angle via a mask for etching.
CONSTITUTION: Many magnetic head elements are formed by a thin film technique on a wafer consisting of a ceramic material, such as Al2O3-TiC and thereafter, the wafer is cut to plural bars in such a manner that these elements line up in one row. These bars are mounted to jigs for exposure. A dry film resist 11 is laminated on the ABS of the slider 10. The film 11 is then exposed with UV rays via a mask and is developed and dried, by which the resist film 12 opened with the patterns to be etched as blanked patterns 12a is formed. This resist film 12 ion milled by ion beams of about 45 to 55° incident angle, by which the blanked patterns 12a are cut away and stepped planes 14 for controlling floating characteristics are obtd. in the side parts of the rails 13. The slider is washed after peeling of the resist film 12, by which the slider having sloped parts 15 of a small width of ≤15μm W between the rails 13 and the planes 14 is obtd.
SASAKI AKINORI
MORITA HARUYUKI
MATSUZAKI MIKIO
