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Patent Searching and Data


Title:
PRODUCTION OF METAL OXIDE BY CHEMICAL VAPOR DEPOSITION METHOD
Document Type and Number:
Japanese Patent JPH03253570
Kind Code:
A
Abstract:

PURPOSE: To form a dense and uniform composite metal oxide film at a high speed by discretely controlling conditions, such as evaporation temp., of raw material metals, flow rate of gases and temp. for mixing with reactive gases.

CONSTITUTION: Raw materials 4, 10 are put into boats 3, 9 and are evaporated by heating to about 130 to 200°C by heaters 7, 11. The evaporated raw materials are transported up to a mixing section S2 where the vapors are mixed with the reactive gases contg. O2. The atmosphere temp. of the mixing section S2 is controlled to about 150 to 200°C to prevent the recrystallization of the evaporated metals and the nucleous formation by a vapor reaction. The sufficiently mixed gases are introduced to a reaction section S3 where the atmosphere is heated to about 500 to 1000°C by a heater 13 to generate a decomposition and oxidation reaction and to form the nuclei on a substrate 14. The crystals are grown with the nuclei as base points. The composite oxide film 14a of the metals is thus formed.


Inventors:
KOBAYASHI CHIHIRO
AIZAWA MASANOBU
HIRAI TOSHIO
YAMANE HISANORI
Application Number:
JP5231590A
Publication Date:
November 12, 1991
Filing Date:
March 02, 1990
Export Citation:
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Assignee:
TOTO LTD
International Classes:
C01B13/20; C01G25/02; C23C16/40; (IPC1-7): C01B13/20; C01G25/02; C23C16/40
Attorney, Agent or Firm:
Yoichiro Shimoda (2 outside)