Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PRODUCTION METHOD FOR MOISTURE-CURABLE POLYETHER- MODIFIED SILICON
Document Type and Number:
Japanese Patent JP2001213955
Kind Code:
A
Abstract:

To provide a method for producing a moisture-curable polyether- modified silicon which is suitable to be used as a sealant, has a very low chlorine content, and is excellent in weatherability.

A moisture-curable polyether-modified silicon having a chlorine content of 10 ppm or lower is produced by reacting a reactive silicon compound with a polyepoxy polyether compound formed by the reaction of a peroxide and a terminally unsaturated polyether compound represented by formula (1), wherein R is a hydrocarbon group, a reaction residue of a polyisocyanate, a residue formed by removing a hydroxyl group from a polycarboxylic acid, a carbonyl group, or a residue formed by removing a hydroxyl group from a poly-N-alkylolamine; R1 is a 2-12C alkylene; R2 is a 1-4C alkylene; R3 is H or methyl; n is 1-1,000; m is 0 or 1; and k is 2-6 or by reacting a reactive silicon compound with a reaction product of the polyepoxy polyether compound and a polyamine compound.


Inventors:
YAMAMOTO GORO
NANIWA KIMIYOSHI
ASAKAWA YUTAKA
MASUDA MICHIHARU
Application Number:
JP2000022855A
Publication Date:
August 07, 2001
Filing Date:
January 31, 2000
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
ASAHI DENKA KOGYO KK
International Classes:
C09K3/10; C08G59/30; C08G65/332; C08G65/333; C08G65/336; (IPC1-7): C08G65/336; C08G59/30; C08G65/332; C08G65/333; C09K3/10
Attorney, Agent or Firm:
Osamu Hatori