Title:
PRODUCTION OF MULTILAYERED ELECTRODE
Document Type and Number:
Japanese Patent JPH01319020
Kind Code:
A
Abstract:
PURPOSE:To form multilayered electrodes disposed with many electrodes having <=1mum line width in parallel by forming a multilayered thin film body by alternate vapor-deposition of insulating layers and conductive layers on a substrate and cutting the multiplayered thin film body to a desired shape. CONSTITUTION:Aluminum is prepd. as the material of the conductive layers 2 and silicon dioxide as the material of the insulating layers 1. Two kinds of these materials are loaded as the material for vapor deposition into a vapor deposition device and the vapor deposition is executed alternately (n+1)th times starting from SiO2 and n times of Al to form the multilayered thin film body 4 consisting of the insulating layers 1 and the conductive layers 2 on the substrate 3 consisting of Si in such a manner that the respective layers are formed to 0.230mum thickness. The multilayered electrodes 6 having n layers of the Al conductive layers 2 separated by the insulating layers 1 consisting of the SiO2 are formed when such multilayered thin film body 4 is cut square to the respective layers. The line width of the electrodes of the multilayered electrodes is confined to <=1mum in this way.
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Inventors:
OTA KOSAKU
INAO KATSUZO
INAO KATSUZO
Application Number:
JP15149088A
Publication Date:
December 25, 1989
Filing Date:
June 20, 1988
Export Citation:
Assignee:
FURUKAWA ELECTRIC CO LTD
International Classes:
G02F1/31; C23C14/06; (IPC1-7): C23C14/06; G02F1/31