Title:
PRODUCTION OF PATTERN-DYEING PRODUCT
Document Type and Number:
Japanese Patent JP3817000
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To give a dyeing pattern of high resolution on a polymer thin film by partially irradiating a polymer thin film containing a quinone and a polymer bearing functional groups which form amino group by irradiation with light and dyeing the irradiated thin film.
SOLUTION: A polymer thin layer 1 containing, as effective components, quinone and a polymer substance bearing functional groups forming amino groups by irradiation with light, for>r example, a functional group of the formula: COO-N=CR1R2 (R1 and R2 are independently an alkyl, an aryl, H) is partially irradiated with light through a photo-mask 3. The polymer thin layer having the parts where amino groups are liberated by light irradiation is dyed to give the objective pattern-dyed product having the dyed parts 5. Since the shape of the thin film is not deformed even after dyeing, this is useful in production of color filters.
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Inventors:
Hiroshi Suyama
Masahiro Kadooka
Masahiro Kadooka
Application Number:
JP33276596A
Publication Date:
August 30, 2006
Filing Date:
November 27, 1996
Export Citation:
Assignee:
NISSHA PRINTING CO.,LTD.
International Classes:
D06P5/00; G02B5/20; D06P5/20; (IPC1-7): D06P5/00; D06P5/00; D06P5/20; G02B5/20
Domestic Patent References:
| JP835184A |
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