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Title:
PRODUCTION OF POLYIMIDE RESIN
Document Type and Number:
Japanese Patent JPH04261430
Kind Code:
A
Abstract:
PURPOSE:To obtain a polyimide resin having low water absorption and excellent solvent resistance by reacting a specific acid anhydride with a specific diamine. CONSTITUTION:The objective polyimide resin can be produced by reacting (A) an acid anhydride containing 65-97mol% of an acid dianhydride [e.g. 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride] and 35-3mol% of an acid trianhydride [e.g. 1,1,1-tris(trimellitic methyl)ethane] with (B) a diamine containing 0.5-100mol% of an aromatic diamine having at least one substituent at the ortho position relative to at least one amino group [e.g. 3,3',5,5'- tetramethyl-4,4'-diaminodiphenyl-methane] while controlling the imidation degree of the product. In the above process, at least a part of the acid anhydride or the diamine is a fluorine-containing compound.

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Inventors:
YUSA MASAMI
TAKEDA SHINJI
KATO TOSHIHIKO
MIYADERA NOBUO
MIYADERA YASUO
Application Number:
JP2227491A
Publication Date:
September 17, 1992
Filing Date:
February 15, 1991
Export Citation:
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Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
C08G73/10; C08G75/00; (IPC1-7): C08G73/10
Attorney, Agent or Firm:
Kunihiko Wakabayashi



 
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