Title:
PRODUCTION OF POLYSILANE COMPOUNDS
Document Type and Number:
Japanese Patent JP2963996
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To simply synthesize a polysilane compound having a high mol.wt. and high setereoselectivity and useful as a conductive material, etc., from a relatively easily available raw material without needing the separation of an isomer by using a specific catalyst.
SOLUTION: This method for producing a polysilane compound of formula IV [(n) is ≥6] comprises subjecting an organic trihydroxysilane compound of the formula: R12SiH3(R12 is an alkyl, an alkenyl or the like) to a dehydrogenation polymerization reaction using a catalyst prepared by reducing with a reducing agent a metal complex of formula III [M is a group 4 metal; X is a halogen; L1 is a cyclopentadienyl group of formula I (R1 to R5 are each H or a ≤3C alkyl); L2 is an N,N'-bis(trialkylsilyl)arylamidinato group of formula II (R6 to R10 are each a ≤3C alkyl; R11 is a ≤10C alkyl)] having the group L1 of formula I and the group L2 of formula II as ligands.
Inventors:
Ohora, Yasutsugu
Tanaka, Masato
Tanaka, Masato
Application Number:
JP1998000269353
Publication Date:
August 13, 1999
Filing Date:
September 24, 1998
Export Citation:
Assignee:
AGENCY OF IND SCIENCE & TECHNOL
International Classes:
C08G77/60; B01J21/06; (IPC1-7): C08G77/60; B01J21/06