Title:
PRODUCTION OF SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JPS5317077
Kind Code:
A
Abstract:
PURPOSE:To improve pattern accuracy and prevent blackening of Au at the time of etching the surface protecting film deposited on Au electrodes by using an etching apparatus of the construction wherein the plasma generating part applied with a high frequency electromagnetic field is isolated form a wafer reaction field.
Inventors:
OOSHIMA YASUNOBU
Application Number:
JP9110076A
Publication Date:
February 16, 1978
Filing Date:
July 30, 1976
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
H01L21/302; H01L21/3065; (IPC1-7): H01L21/302