Title:
PRODUCTION OF SILICON CRYSTAL FILM
Document Type and Number:
Japanese Patent JPS5261475
Kind Code:
A
Abstract:
PURPOSE:To form a uniform film of large aprticle sizes by depositing a film containing more than one of C, B, SiCBC, AlC on a substrate and recrsytalizing said film.
Inventors:
SAITOU TADASHI
MINAGAWA SHIGEKAZU
TOKUYAMA KON
MINAGAWA SHIGEKAZU
TOKUYAMA KON
Application Number:
JP13718875A
Publication Date:
May 20, 1977
Filing Date:
November 17, 1975
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/205; C22F1/16; H01L21/20; (IPC1-7): C22F1/16; H01L21/20