Title:
PRODUCTION OF SPUTTERING TARGET
Document Type and Number:
Japanese Patent JPH11172425
Kind Code:
A
Abstract:
To produce a high-performance and high-quality sputtering target.
This sputtering target is produced by mixing aluminum powder and the powder of reactive metal other than aluminum, subjecting this mixed powder to cold pressing, working this cold-pressed powder into a cylinder shape and subjecting this cylinder to hot pressing in a vacuum. By this producing method, the high-performance and high-quality sputtering target in which compsn., structure and density are uniform over the whole body, and the ratio of the weight of aluminum is regulated to ≥2% can be produced.
Inventors:
ANNAVARAPU SURESH
ETTLINGER JOHN
SICA TONY
ETTLINGER JOHN
SICA TONY
Application Number:
JP26903898A
Publication Date:
June 29, 1999
Filing Date:
September 08, 1998
Export Citation:
Assignee:
MATERIALS RESEARCH CORP
International Classes:
B22F1/00; C22C1/04; C23C14/34; B22F3/14; (IPC1-7): C23C14/34; B22F3/14; C22C1/04
Attorney, Agent or Firm:
Akira Koike (2 outside)
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