Title:
RANDOM PULSE DC POWER SOURCE
Document Type and Number:
Japanese Patent JP2007002335
Kind Code:
A
Abstract:
To provide a power supply for use in a physical vapor chamber having a target and a substrate support.
The power supply comprises a power source configured to bias the target with a sputtering voltage relative to the substrate support and configured to bias the target with a reverse voltage about 10 or more times for a period of about one second after an arc is detected inside the physical vapor deposition chamber.
Inventors:
HOSOKAWA AKIHIRO
Application Number:
JP2006165593A
Publication Date:
January 11, 2007
Filing Date:
June 15, 2006
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
C23C14/34; H01L21/285
Domestic Patent References:
| JPH05311433A | 1993-11-22 | |||
| JP2002235170A | 2002-08-23 |
Attorney, Agent or Firm:
Yoshiaki Anzai