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Patent Searching and Data


Title:
RAW MATERIAL VAPORIZATION CONTROL SYSTEM
Document Type and Number:
Japanese Patent JPS6467243
Kind Code:
A
Abstract:

PURPOSE: To control temperature easily by providing a heating means to control the temperature respectively in a raw material container, a mass flowmeter and pipelines to connect said container and flowmeter and installing a heater to heat the mass flow meter and the gas line for the mass flowmeter in an insulating box.

CONSTITUTION: A raw material container 1, a mass flowmeter 2 and heating means 11W13 to be installed on a pipeline 3 to connect said container and meter and to control temperature respectively are provided in a device to control accurately and stably the vaporization feeding of a liquid or solid material or the like to be used for the manufacture of semiconductor elements, optical fibers or the like. Also, a heater 18 to heat directly a base 17 constituting of a gas flowing line of the mass flowmeter 2 as a heating means for the mass flowmeter 2, is installed and the mass flowmeter 2 and the heater 18 are contained in an insulating box 14. As a result, the device can be made compact, and the temperature control by means of adequate heating control can be carried out. Also, the O point of the mass flowmeter can be adjusted easily.


Inventors:
NAKAMURA TAKESHI
AIKAWA TSUNEO
ARAI MAYUMI
Application Number:
JP22457587A
Publication Date:
March 13, 1989
Filing Date:
September 08, 1987
Export Citation:
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Assignee:
NIPPON TYLAN KK
International Classes:
H01L21/205; B01D1/00; B01J7/00; C03B37/014; C03B37/018; C23C16/44; C23C16/448; (IPC1-7): B01J7/00; C03B37/018; C23C16/44; H01L21/205
Attorney, Agent or Firm:
Hiroshi Hayashi (1 person outside)