VHF/UHF REACTION APPARATUS - APPLIED MATERIALS INC

Title:

VHF/UHF REACTION APPARATUS

Document Type and Number:

Japanese Patent JPH04247878

Kind Code:

A

Abstract:

PURPOSE: To provide a plasma enhanced reaction apparatus which uses high-frequency AC energy by constituting an electrode as part of an integrated coaxial transmission line structural body which directly connects AC energy to a chamber and forms plasma therein.

CONSTITUTION: The plasma processing reaction apparatus 10 is formed of the chamber 33 and the electrode 32C. The electrode 32C is constituted as part of the integrated coaxial transmission line structural body 32 which directly connects the AC energy of the selected frequency to the chamber 32 and forms the plasma therein. The integrated coaxial transmission line structural body 32 is opened by a central conductor 32C, insulator 32I and outer conductor 320 which are wafer supporting electrodes. As a result, the vapor deposition and energy velocity commercially executable for various kinds of the conductors, insulators and semiconductor blanks may be provided.

Inventors:

KENISU ESU KORINZU
KUREIGU EI ROODERITSUKU
CHIYAN RON YAN
DEIBUITSUDO ENU KEI WAN
DAN MEIDAN

Application Number:

JP19029491A

Publication Date:

September 03, 1992

Filing Date:

July 30, 1991

Export Citation:

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Assignee:

APPLIED MATERIALS INC

International Classes:

C23C16/50; C23F4/00; H01L21/205; H01L21/285; H01L21/302; H01L21/3065; H01L21/31; H05H1/46; (IPC1-7): C23C16/50; C23F4/00; H01L21/205; H01L21/285; H01L21/302; H01L21/31

Domestic Patent References:

JPH01122600A

1989-05-15

Attorney, Agent or Firm:

Minoru Nakamura (7 outside)

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