Title:
再循環型基板コンテナパージングシステム及び方法
Document Type and Number:
Japanese Patent JP6982050
Kind Code:
B2
Abstract:
To provide a method and system for reducing consumption of a purge gas for a semiconductor substrate container.SOLUTION: In a loading port system having recirculating purging, the method includes the steps of: filtering and purifying a gas stream from a substrate container while maintaining a required cleanliness level; and recirculating the purge gas back to the substrate container by receiving a gas stream from a loading port or including a recirculation tank.SELECTED DRAWING: Figure 4A
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Inventors:
Lubstock, Lutz
Application Number:
JP2019215213A
Publication Date:
December 17, 2021
Filing Date:
November 28, 2019
Export Citation:
Assignee:
Brooks CCS GmbH
International Classes:
H01L21/673
Domestic Patent References:
| JP2007005599A | ||||
| JP2001284433A | ||||
| JP2010182747A | ||||
| JP2005026674A | ||||
| JP2006156712A | ||||
| JP2005327815A | ||||
| JP2000353738A | ||||
| JP2000297953A |
Foreign References:
| US4724874 | ||||
| KR1020040072383A |
Attorney, Agent or Firm:
Shigeki Yamakawa
Masaki Yamakawa
Masaki Yamakawa
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