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Title:
RECOVERY OF SEMICONDUCTOR WASHING WASTE WATER CONTAINING ORGANIC ALKALI
Document Type and Number:
Japanese Patent JPH0839059
Kind Code:
A
Abstract:

PURPOSE: To stably and efficiently adsorb and remove org. alkali in a strong acidic cation exchange (SC) column by passing semiconductor washing waste water containing org. alkali discharged from a semiconductor manufacturing process through the SC column.

CONSTITUTION: Semiconductor washing waste water containing org. alkali is successively passed through an activated carbon bed 1, a weak basic anion exchange resin bed 2, a strong basic anion exchange resin bed 3 and a strong acidic cation exchange bed 4. Therefore, by providing the SA bed 3 to the front stage of the SC bed 4, the pH of the inflow water to the SC bed becomes stable and can be always held to an alkali side without being affected by the fluctuations of anion load and the adsorption and removal of org. alkali is made stable and efficient.


Inventors:
OSAWA KIMINOBU
KOIZUMI MOTOMU
Application Number:
JP17677794A
Publication Date:
February 13, 1996
Filing Date:
July 28, 1994
Export Citation:
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Assignee:
KURITA WATER IND LTD
International Classes:
C02F1/28; B01J41/04; C02F1/42; C02F9/00; (IPC1-7): C02F1/42; B01J41/04; C02F1/28; C02F9/00
Attorney, Agent or Firm:
Tsuyoshi Shigeno