Title:
REDUCTION PROJECTION EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2589060
Kind Code:
B2
Abstract:
PURPOSE: To accurately transfer a transfer aperture pattern near to resolution limit.
CONSTITUTION: Exposure is performed by using light transmitted through the transfer aperture pattern 4; the light having a phase inverted to the phase of the light transmitted through plural fine aperture patterns 5b and 5c provided adjacently to the pattern 4 and being equal to or under the resolution limit, which are not transferred to a wafer, and transmitted through the pattern 4; and the light having the phase inverted to the phase of the light transmitted through plural fine aperture patterns 5a and 5d provided adjacently to the patterns 5b and 5c and being equal to or under the resolution limit, which are not transferred to the wafer, and transmitted through the patterns 5a and 5d.
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Inventors:
Tsuneo Terasawa
Moriyama Shigeo
Rie Kurosaki
Yoshio Kawamura
Moriyama Shigeo
Rie Kurosaki
Yoshio Kawamura
Application Number:
JP16605396A
Publication Date:
March 12, 1997
Filing Date:
June 26, 1996
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
G03F1/29; G03F1/68; G03F1/70; G03F7/20; H01L21/027; (IPC1-7): G03F7/20; G03F1/08; H01L21/027
Domestic Patent References:
| JP6250811B2 |
Attorney, Agent or Firm:
Junnosuke Nakamura