REFLECTION MEASURING APPARATUS AND REFLECTION MEASUREMENT METHOD

Title:

REFLECTION MEASURING APPARATUS AND REFLECTION MEASUREMENT METHOD

Document Type and Number:

Japanese Patent JP2008216175

Kind Code:

A

Abstract:

To propose a reflection measuring apparatus and a method for measuring a sample with no damage in the sample formed on a substrate.

The reflection measuring apparatus for irradiating the sample S formed on the substrate P with measuring light L1 and detecting a reflection light L2 from it comprises: a spectrophotometer for transmitting the measuring light L1 emitted from a light source toward a sample measuring surface T, and receiving the reflection light L2 from it; and a substrate stage for supporting the substrate P, and relatively moving the sample S toward the sample measuring surface T. The sample measuring surface T is configured so as to be spaced from the surface of a sample stage 20 in the spectrophotometer at a predetermined distance.

Inventors:

NISHIJIMA TATSUMI

Application Number:

JP2007056960A

Publication Date:

September 18, 2008

Filing Date:

March 07, 2007

Export Citation:

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Assignee:

SEIKO EPSON CORP

International Classes:

G01N21/27; G01B11/06; G01N21/35

Attorney, Agent or Firm:

Kazuya Nishi
Masatake Shiga
Masakazu Aoyama

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