Title:
RESIN COMPOSITION HAVING ANTISTATIC PROPERTY
Document Type and Number:
Japanese Patent JPH0753814
Kind Code:
A
Abstract:
PURPOSE: To obtain the composition useful for producing parts of electronic devices, etc., having excellent heat resistance, solvent resistance and mechanical strength, comprising a specific styrenic polymer, a specific polyhydric alcohol fatty acid ester in a specific ratio.
CONSTITUTION: This composition comprises (A) 95-99.5wt.% of a styrenic polymer having high syndiotactic structure, (B) 0.5-5.0wt.% of a polyhydric alcohol fatty acid ester (SV is saponification value of ester; NV is neutralization value of fatty acid) having 6-9 HLB such as polyglycerol stearic ester or (C) 0.025-6.5wt.% of an organic sulfonic acid metal salt such as sodium alkylaryl sulfonate.
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Inventors:
UCHIDA TAKAAKI
Application Number:
JP20308293A
Publication Date:
February 28, 1995
Filing Date:
August 17, 1993
Export Citation:
Assignee:
IDEMITSU KOSAN CO
International Classes:
B29C55/02; B29D7/01; C08J5/18; C08K5/10; C08K5/103; C08K5/36; C08K5/42; C08L25/00; C08L25/04; B29K25/00; (IPC1-7): C08L25/00; C08K5/103; C08K5/42
Attorney, Agent or Firm:
Otani Ho
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