Title:
樹脂、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7137911
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resin and a resist composition capable of producing a resist pattern having good line edge roughness (LER).SOLUTION: There are provided: the resin which has a structural unit derived from a compound represented by formula (I) and a structural unit (a4) having fluorine atoms; and the resist composition containing the same. [In the formula, Rand Reach independently represent a hydrogen atom, a halogen atom, or an alkyl group optionally having a halogen atom; Rand Reach independently represent an alkyl group; Arepresents a single bond, an alkanediyl group, or-A-X-(A-X)-(A)-; * represents a bond with an oxygen atom; A, Aand Aeach independently represent an alkanediyl group; Xand Xeach independently represent an oxygen atom, a carbonyloxy group, or an oxycarbonyl group; a represents 0 or 1; and b represents 0 or 1.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Masahiko Shimada
Koji Ichikawa
Masahiko Shimada
Koji Ichikawa
Application Number:
JP2016155663A
Publication Date:
September 15, 2022
Filing Date:
August 08, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F220/22; G03F7/004; G03F7/039
Domestic Patent References:
| JP2015107955A | ||||
| JP2014224095A | ||||
| JP2014115623A | ||||
| JP2012006908A |
Foreign References:
| WO2005085301A1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation