Title:
RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2023100003
Kind Code:
A
Abstract:
To provide a resin and a resist composition which allow a resist pattern having good resolution to be produced.SOLUTION: There are provided: a resin containing structural units of formula (I1) and formula (I2); and a resist composition.SELECTED DRAWING: None
Inventors:
NAKAMURA HIROMU
KITAMURA ISSEI
ICHIKAWA KOJI
KITAMURA ISSEI
ICHIKAWA KOJI
Application Number:
JP2022211524A
Publication Date:
July 14, 2023
Filing Date:
December 28, 2022
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F220/38; C07C309/17; C07C381/12; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Patent Attorney Corporation Shinju Global IP
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