To uniformly form a resist coating film applied on a glass substrate.
This device has at least a nip roller 2, a roll bar 3 and a roll bar supporting member 6 provided in a receiver 5 of a resist and for supporting the roll bar 3 in a resist solution 4, the roll bar 3 is composed of a coating roll part 3a having the axial direction length as long as the width of the coating zone of the glass substrate 1 and a diameter reduced part 3c for connecting a roll holding part 3b to the coating roll part 3a and the resist solution is applied on the glass substrate by scooping up the resist solution in the receiver 5 by a roll bar 3 while passing the glass substrate 1 between the nip roller 2 and the roll bar 3. In such a case, the length of the roll bar supporting member 6 in the axial direction is controlled to almost the same length of the coating roll part 3a of the roll bar 3 in the axial direction.
ICHIMURA YUKIO
KONO KAZUHIRO
KATAOKA SHINYA
TANIGUCHI HIDEAKI
YOSHIDA KAZUTOSHI
MITOBE KOICHI
NAMIKI JUNICHI
HITACHI DEVICE ENG
HITACHI CHIBA ELECTRON KK