Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7195331
Kind Code:
B2
Abstract:
A resist composition including a base material component (A), an acid generator component (B), and a mixed solvent (S) in which an organic solvent (S1) represented by Formula (s1) is mixed, in which the acid generator component (B) contains a compound (B1) represented by Formula (b1). In the formula, Rb1 represents an aryl group. Rb2 and Rb3 each independently represent an aliphatic hydrocarbon group. Lb1, Lb2, and Lb3 each independently represent a divalent linking group or a single bond. X− represents a counter anion. R1 and R2 each independently represent an alkyl group having 1 to 6 carbon atoms
Inventors:
Nakamura Go
Suzuki Yousuke
Lee Jun Yob
Suzuki Yousuke
Lee Jun Yob
Application Number:
JP2020546850A
Publication Date:
December 23, 2022
Filing Date:
August 29, 2019
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C07D333/46; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014141455A | ||||
| JP2013011870A |
Foreign References:
| WO2010123066A1 | ||||
| WO2018092760A1 |
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
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