Title:
レジスト組成物およびレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7304693
Kind Code:
B2
Abstract:
There is provided a resist composition including: a polymer component that is capable of being made soluble or insoluble in a developer by an action of an acid; an acid-generating agent configured to generate the acid by an exposure; and a quencher having a basicity for the acid, wherein, with respect to a first radiation having a wavelength of 300 nm or less and a second radiation having a wavelength of more than 300 nm, at least one of the acid-generating agent and the quencher has a light absorption wavelength, which is shifted so as to absorb the second radiation when irradiated with the first radiation and not irradiated with the second radiation, is decomposed when irradiated with the first radiation and then irradiated with second irradiation, and is not decomposed when not irradiated with the first irradiation and irradiated with the second radiation.
Inventors:
Seiji Nagahara
Gosuke Shiraishi
Din Conquer
Gosuke Shiraishi
Din Conquer
Application Number:
JP2018237804A
Publication Date:
July 07, 2023
Filing Date:
December 19, 2018
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G03F7/004; C09K3/00; G03F7/038; G03F7/039; G03F7/20; G03F7/38
Domestic Patent References:
| JP2019182813A |
Foreign References:
| WO2015129284A1 | ||||
| WO2018074382A1 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito