Title:
レジスト組成物及びレジストパターン形成方法
Document Type and Number:
Japanese Patent JP7475134
Kind Code:
B2
Abstract:
To provide a resist composition which achieves higher sensitivity, is excellent in lithographic characteristics, and is capable of forming a resist pattern having high rectangularity, and to provide a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains a compound (D0) represented by general formula (d0) and a polymer compound having a constituent unit (a0) derived from a compound represented by general formula (a0-1). In the formula (d0), Rd0 is a monovalent organic group; Xd0 is -O- or the like; Yd0 is a single bond or the like; and Mm+ represents an m-valent organic cation. In the formula (a0-1), W1 is a polymerizable group-containing group; Ct is a tertiary carbon atom; the α-position of Ct is a carbon atom constituting a carbon-carbon unsaturated bond; R11 is an aromatic hydrocarbon group or a chain hydrocarbon group; and R12 and R13 are each a chain hydrocarbon group or are bonded to each other to form a cyclic group.SELECTED DRAWING: None
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Inventors:
Yousuke Suzuki
Yasuhiro Yoshii
Youichi Hori
Takahiro Kojima
Mari Murata
Yasuhiro Yoshii
Youichi Hori
Takahiro Kojima
Mari Murata
Application Number:
JP2019234513A
Publication Date:
April 26, 2024
Filing Date:
December 25, 2019
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; C08F20/10; G03F7/039; G03F7/20
Domestic Patent References:
| JP2016085382A | ||||
| JP2020181064A |
Foreign References:
| WO2020246143A1 | ||||
| WO2018061944A1 |
Attorney, Agent or Firm:
Sumio Tanai
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida
Masahisa Matsumoto
Ryu Miyamoto
Masato Iida