RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023166399

Kind Code:

A

Abstract:

To provide a resist composition from which a resist pattern having good CDU can be produced.SOLUTION: The resist composition contains: an acid generator containing a salt represented by a specific structure; and a resin containing a structural unit having an acid-labile group and a structural unit having a specific structure.SELECTED DRAWING: None

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Inventors:

KOMURO KATSUHIRO
FUJITA SHINGO
ICHIKAWA KOJI

Application Number:

JP2023131276A

Publication Date:

November 21, 2023

Filing Date:

August 10, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C08F212/14; C08F220/18; C08F220/20; C09K3/00; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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