RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Title:

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023169223

Kind Code:

A

Abstract:

To provide a resist composition.SOLUTION: The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin containing a structural unit having an acid-labile group and a structural unit represented by formula (a2-A).SELECTED DRAWING: None

Inventors:

ADACHI YUKAKO
MUKAI YUKO
ICHIKAWA KOJI

Application Number:

JP2023144144A

Publication Date:

November 29, 2023

Filing Date:

September 06, 2023

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C08F212/08; C08F220/10; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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