Title:
RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JPH08316121
Kind Code:
A
Abstract:
PURPOSE: To improve the wettability of the surface of a carbon film to precisely develop and form a resist pattern on the carbon film.
CONSTITUTION: A method for forming a resist pattern to form a resist pattern 6a by exposing and developing a resist film 6 deposited on a carbon film 4 to become a reflection preventive film comprises the steps of oxidizing the surface of the film 4 to hydrophilize the surface of the film 4, wherein the oxidizing step is conducted by exposing it with strong acid solution, ozone, ozone water solution or oxygen plasma.
Inventors:
NAKANO RITSUKO
HIROSE MINORU
HIROSE MINORU
Application Number:
JP11827895A
Publication Date:
November 29, 1996
Filing Date:
May 17, 1995
Export Citation:
Assignee:
FUJITSU LTD
International Classes:
G03F7/11; C23F1/00; H01L21/027; (IPC1-7): H01L21/027; C23F1/00; G03F7/11
Attorney, Agent or Firm:
Teiichi