PURPOSE: To irradiate sufficiently a light to the side wall of a resist pattern also to improve the etching resisting characteristic or the like by arranging a light scattering plate near a substrate and irradiating the scattered light to the resist pattern through this light scattering plate.
CONSTITUTION: A resist pattern processing device consists of a light source 11 which emits an ultraviolet light, a reflecting plate 12 which reflects the light from the light source 11, and a light scattering plate 13 arranged in the front of the light source 11 and the reflecting plate 12, and the light scattering plate 13 is arranged near the surface of a sample 14 to face it. Since the light scattering plate 13 is used, not only the upper face of the resist pattern but also the side wall is irradiated sufficiently with the light. Thus, the light irradiating processing for improving the etching resisting characteristic or the like of the resist pattern is performed effectively, and the light irradiating processing time is shortened in comparison with a conventional device.
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WATANABE TORU
OKUMURA KATSUYA
