To provide a resist removing device which reduces the frequency of maintenance.
Removal liquid 19 is sprayed from nozzles 18 provided above a belt conveyor 15 toward a substrate 12 to be cleaned to remove a resist film 12a on the surface of the substrate 12. Since the substrate 12 is located on the belt conveyor 15, unlike in a conventional device, the removed resist film 12a is prevented from twisting around a conveying roll, which allows the substrate 12 to be conveyed in good conditions. Further, since the removal liquid 19 is sprayed in the oblique direction toward the substrate 12, the resist film 12a can be removed almost completely, and the flowing direction of the removal liquid 19 on the substrate 12 is kept constant, ensuring a stabilized flow of the removed resist film 12a. Thus, the resist film 12a is prevented from being retained at the bottom of a removal chamber 11, thereby reducing the frequency of maintenance.
KATO KOICHIRO
TERASHI NOBUO
PIONEER DISPLAY PROD CORP