Title:
RETAINER RING STRUCTURE FOR CHEMICAL MECHANICAL POLISHER, AND MANUFACTURING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2015037142
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a retainer ring structure for a chemical mechanical polisher (CMP) which improves durability and can be manufactured at low cost, and a manufacturing method thereof.SOLUTION: The retainer ring structure comprises: an insert ring 14 of a metal material with which a plurality of holes 15 are formed on a top face, for coupling to a head of the CMP; a plurality of insert pins 16 of resin materials each including a body provided with a hollow part of which the top face is opened, and one or more long groove parts formed in a length direction on a side face of the body; and an external ring formed by surrounding the insert pins and the insert ring. The metal material ring surrounded by the resin material ring is prevented from being exposed outside, thereby preventing contamination and corrosion of the metal material ring and improving durability and the metal material that can be manufactured at low cost is used, thereby reducing manufacture cost and improving merchantability.
Inventors:
KIM BU SOON
CHOI HEUNG SUN
CHOI HEUNG SUN
Application Number:
JP2013168717A
Publication Date:
February 23, 2015
Filing Date:
August 14, 2013
Export Citation:
Assignee:
CNUS CO LTD
International Classes:
H01L21/304; B24B37/32
Domestic Patent References:
| JP2006502576A | 2006-01-19 | |||
| JP2006352108A | 2006-12-28 |
Foreign References:
| US20120319321A1 | 2012-12-20 |
Attorney, Agent or Firm:
Toshio Yoshikawa
Ichikawa 寛奈
Ichikawa 寛奈
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