Title:
RETICLE VERIFICATION SYSTEM AND PROGRAM
Document Type and Number:
Japanese Patent JP2009063653
Kind Code:
A
Abstract:
To verify exposure results by an exposure element provided to a reticle in advance.
A CPU 7 refers to graphic data and coordinate information on an exposure element stored in a data file storage part 5 of a storage part 8, generates a panel layout element on a display panel corresponding to the exposure element, determines the positional relationship between a plurality of panel layout elements on the display panel, and thereby verifies whether the exposure element is an error. A display part 1 displays the verification results in a panel substrate window 9 or a reticle window 10.
Inventors:
SENDA HIDEKI
Application Number:
JP2007229215A
Publication Date:
March 26, 2009
Filing Date:
September 04, 2007
Export Citation:
Assignee:
JEDAT INC
International Classes:
G02F1/13; G03F1/68; G03F1/70; G03F1/84
Domestic Patent References:
JP2004265386A | 2004-09-24 | |||
JP2004038046A | 2004-02-05 | |||
JP2000089448A | 2000-03-31 | |||
JP2008304716A | 2008-12-18 | |||
JPH10214770A | 1998-08-11 | |||
JP2005005520A | 2005-01-06 |
Attorney, Agent or Firm:
Shuichi Otsuka
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