To provide a means for supplying a lithography apparatus with liquid refined to reusable level by removing impurities efficiently and stabilizing optical properties in which the liquid of poor liquid quality can be removed quickly from the system when the liquid quality of the liquid for lithography to be supplied to the apparatus becomes unusable for some reason, and a steady state where the liquid for lithography having good quality is supplied to the apparatus can be restored early.
The reuse system 1 includes a three-way channel adjusting valve 610 provided at the inlet of exposure processing equipment 100, a channel switching valve 601 provided at the outlet of a purifier 180, a sub-channel 20 connecting the three-way channel adjusting valve 610 and the channel switching valve 601 provided through a cleaning liquid storing tank 510 so that the liquid 301 can return from the inlet of the exposure processing equipment 100 to the outlet of the purifier 180, and a channel switching valve 602 provided closer to the side of the purifier 180 than the position of the three-way channel adjusting valve 610 so that the liquid 301 can be discharged to the outside of the circulation system.
KISHIDA TAKANORI
YAMADA KINJI
Koji Kikawa
Chongqing Sugano