Title:
リソグラフ投影ツールのエミュレーション法
Document Type and Number:
Japanese Patent JP2007535135
Kind Code:
A
Abstract:
Techniques for producing emulations of lithographic tools and processes using virtual wafers and lithographic libraries are described. Emulating a lithographic projection imaging machine includes determining characteristics of the imaging machine, of a reticle used in the imaging machine, and of layer specific processes. Then performing emulation on a virtual wafer using the characteristics of the imaging machine, reticle, and layer specific processes. The machine characteristics determined include characteristics of an exposure source, lens aberration, exit pupil, mechanics, vibration, calibration offsets, or resist. The reticle characteristics determined include distortion, critical dimension, phase transmission error, mask clips, as drawn specifications, or mask sites. And, the layer specific process characteristics include machine model, machine setting identification, and field exposure sequencing. Emulation results can be entered into an optimizer and optimum operating conditions related to the projection imaging machine are determined.
Inventors:
Adry H. Smith
Robert Oh Hunter Jr.
Joseph Bendick
Robert Oh Hunter Jr.
Joseph Bendick
Application Number:
JP2006547641A
Publication Date:
November 29, 2007
Filing Date:
April 20, 2005
Export Citation:
Assignee:
LITEL INSTRUMENTS
International Classes:
H01L21/027; G03F1/08; G03F7/20; G06F17/50; G06G7/62; G03F
Attorney, Agent or Firm:
Masahiro Ishino
Kazuhisa Inaba
Kazuhisa Inaba