Title:
RUBBING TREATMENT, PRODUCTION OF LIQUID CRYSTAL ELEMENT AND LIQUID CRYSTAL ELEMENT
Document Type and Number:
Japanese Patent JPH10197869
Kind Code:
A
Abstract:
To provide a rubbing treatment method which is decreased in the display defects at the panel end of the boundaries between peripheral regions and display regions and a liquid crystal element.
In the rubbing treatment method of imparting orientation regulating force on a substrate by friction, the substrate is at least partly covered by a mask and the regions of the substrate not covered by the mask are subjected to a rubbing treatment. The rubbing treatment is so executed that the direction of the treatment forms an angle of 45°±20° with the boundary lines between the regions of the mask covered by the mask and the regions not covered by the mask.
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Inventors:
MIURA KIYOSHI
KODERA YASUHITO
AOYAMA KAZUHIRO
SAITO MASAMICHI
SATO FUMIYOSHI
KODERA YASUHITO
AOYAMA KAZUHIRO
SAITO MASAMICHI
SATO FUMIYOSHI
Application Number:
JP35852796A
Publication Date:
July 31, 1998
Filing Date:
December 29, 1996
Export Citation:
Assignee:
CANON KK
International Classes:
G02F1/1337; (IPC1-7): G02F1/1337; G02F1/1337
Attorney, Agent or Firm:
Tokuhiro Watanabe
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