SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023079200

Kind Code:

A

Abstract:

To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.SOLUTION: There are provided a salt represented by formula (I), an acid generator containing the salt, a resin derived from the salt, and a resist composition.SELECTED DRAWING: None

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Inventors:

SHIMADA MASAHIKO
ICHIKAWA KOJI

Application Number:

JP2022187575A

Publication Date:

June 07, 2023

Filing Date:

November 24, 2022

Export Citation:

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Assignee:

SUMITOMO CHEMICAL CO

International Classes:

G03F7/004; C07C69/54; C07C69/90; C07C309/12; C07C309/17; C08F220/30; C08F220/38; C09K3/00; G03F7/038; G03F7/039

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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