塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Title:

塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

Document Type and Number:

Japanese Patent JP2024055820

Kind Code:

A

Abstract:

【課題】良好なＣＤ均一性を有するレジストパターンを製造することができる塩、レジスト組成物等を提供する。【解決手段】式（Ｉ）で表される塩、酸発生剤及びレジスト組成物。TIFF2024055820000228.tif59158［式中、ＸはＳ又はＩ；ｍ１０は０又は１；Ａｒ１－Ａｒ３は其々芳香族炭化水素基；Ｒ１－Ｒ３は其々＊－Ｏ－Ｒ１０、＊－Ｏ－ＣＯ－Ｒ１０等；Ｒ１０は酸安定炭化水素基；Ｒ４－Ｒ９は其々ハロゲン原子、ハロアルキル基等。］【選択図】なし

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Inventors:

Hiroshi Nakamura
Nobuhiko Nishitani
Koji Ichikawa

Application Number:

JP2023172722A

Publication Date:

April 18, 2024

Filing Date:

October 04, 2023

Export Citation:

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Assignee:

Sumitomo Chemical Co., Ltd.

International Classes:

G03F7/004; C07C69/712; C07C381/12; C07D307/93; C07D321/10; C07D333/76; C08F220/10; C09K3/00; G03F7/038; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

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