Title:
SEALING METHOD FOR SLIDABLY CONTACTING PART BETWEEN FIXED TANK AND TURNTABLE IN DRY FLUID BARREL POLISHING DEVICE AND DRY FLUID BARREL POLISHING DEVICE
Document Type and Number:
Japanese Patent JP2003103450
Kind Code:
A
Abstract:
To prevent biting of a thin workpiece to be polished with a thickness of ≤1 mm or foreign matter such as small burrs peeled off a workpiece to be polished or fragments of abrasive occurring during a polishing process in a gap where a fixed tank and a turntable composing a polishing tank slidably contact in regard to a dry fluid barrel polishing device.
The gap 7 where the fixed tank 2 and the turntable 3 slidably contact during the polishing process is covered by a covering fluidized bed 16 formed by charging hard spherical particles 14, and a polishing fluidized bed 17 is formed by mixing the abrasive 13 and the workpiece 15 to be polished on a top face of the covering fluidized bed 16 to carry out the polishing process.
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Inventors:
NISHIMURA KAZUTOSHI
ISHIDA TAKAO
SAKAI SHIGEKAZU
ISHIDA TAKAO
SAKAI SHIGEKAZU
Application Number:
JP2001300534A
Publication Date:
April 08, 2003
Filing Date:
September 28, 2001
Export Citation:
Assignee:
SINTOBRATOR LTD
International Classes:
B24B31/12; B24B31/108; (IPC1-7): B24B31/12; B24B31/108